Nka nka
| Ihe mejupụtara | Ọdịnaya | CAS Mba. |
| Mmiri dị ọcha | 85-90% | 7732-18-5 |
| Sodium benzoate | 0.1-0.2% | 532-32-1 |
| Surfactant | 4-5% | ∕ |
| Ndị ọzọ | 4-5% | ∕ |
Njirimara ngwaahịa
1, High gburugburu ebe obibi nchebe larịị: Nhọrọ etching nwere ike nweta na-enweghị ojiji nke organic bases dị ka TMAH.
2, Low mmepụta na-eri: Iji NaOH / KOH dị ka etching mmiri mmiri, na-eri bụ nnọọ ala karịa acid polishing na etching usoro.
3, High etching arụmọrụ: Tụnyere acid polishing na etching usoro, batrị arụmọrụ na-abawanye site karịa 0,15%.
Ngwa ngwaahịa
1, Ngwaahịa a bụ n'ozuzu adabara Perc na Topcon batrị Filiks;
2, Kwesịrị ekwesị maka otu kristal nke 210, 186, 166, na 158 nkọwa.
Ntuziaka maka ojiji
1, Tinye ihe kwesịrị ekwesị ego nke alkali n'ime tank (1.5-4% dabere na KOH / NAOH olu ruru)
2, Tinye ihe kwesịrị ekwesị ego nke ngwaahịa a n'ime tank (1.0-2% dabere na olu ruru)
3, kpoo mmiri mmiri na-egbuke egbuke na 60-65 ° C
4, Tinye silicon wafer na azụ PSG wepụrụ n'ime tank polishing, oge mmeghachi omume bụ 180s-250s.
5, Na-atụ aro arọ ọnwụ kwa akụkụ: 0.24-0.30g (210 wafer isi iyi, ndị ọzọ na isi mmalite na-converted na hà n'ike-n'ike) otu na polycrystalline PERC anyanwụ cell
Mkpachapụ anya
1. Tụkwasị na mkpa ka echekwara nditịm n'ebe ìhè.
2, Mgbe mmepụta akara na-adịghị amị, mmiri kwesịrị replenished na drained ọ bụla 30 nkeji.Ọ bụrụ na enweghi mmepụta maka ihe karịrị awa 2, a na-atụ aro ka ịwụpụ ma mejupụta mmiri mmiri.
3, New akara debugging chọrọ DOE imewe dabere na onye ọ bụla usoro nke mmepụta akara iji nweta usoro kenha, si otú maximizing arụmọrụ.Usoro akwadoro nwere ike na-ezo aka na debugging.
